Core preparation process
Titanium targets are core coating materials designed for physical vapor deposition (PVD) and magnetron sputtering, which are widely suitable for high-end coating preparation, semiconductor chip and precision electronic component production, and are indispensable key basic materials in advanced manufacturing, semiconductors, medical and other fields.
Raw material selection
Titanium targets are made of 99.99% high-purity titanium blocks as raw materials, and the surface is strictly controlled without oxidation, impurities, cracks and other defects, ensuring uniform material and purity standards, and ensuring coating and sputtering quality from the source.
Vacuum melting
The titanium target adopts a vacuum arc melting furnace, heated to above 1668 °C (titanium melting point) to completely melt the raw material, and the whole process of high vacuum environment isolates gas impurities; In special scenarios, it can be operated in a protective atmosphere such as argon gas to prevent material oxidation.
Precision forging
After the titanium target is cast and formed by molten titanium liquid, it is uniformly forged and pressed by a hydraulic press, with the whole process of temperature control and heat preservation, to ensure the ductility and structural density of the material.
Rough molding
Titanium targets are machined through CNC lathes and milling machines to accurately shape to the target size and shape to meet the requirements of equipment adaptation.
Heat treatment intensification
Titanium targets were subjected to heat treatment such as solution solution and annealing at 800–1000°C to optimize the microstructure structure and significantly improve the strength and toughness of the target.
Surface finishing
The titanium target is treated with multi-stage grinding and fine polishing, and the surface finish and flatness meet the standards to ensure that the sputtering film is uniform and stable.
Core features of the product
Excellent performance: high density, high heat resistance, stable structure, can adapt to complex and severe coating and sputtering conditions.
Chemical stability: strong corrosion resistance, good chemical inertness, long service life, good coating consistency.
Outstanding value: Although the raw material and processing costs are high, the comprehensive performance is leading, and it is an irreplaceable key consumable in the high-tech field.
Main application fields
Semiconductor field
One of the core raw materials for chip manufacturing, it is used for coating and process processes of key components such as transistors and integrated circuits.
Industrial field
It is used in high-end functional coatings, anti-corrosion and wear-resistant coatings, covering automobiles, precision manufacturing, high-end equipment and other industries.
Medical field
It has excellent biocompatibility and can be used for surface coating and molding processing of medical devices such as artificial joints and dental implants.
Customization and service
It supports customized supply according to customer needs, and can quickly provide accurate quotations and efficient delivery according to detailed requirements such as purity, size, tolerance, and technical parameters to meet the needs of R&D, small-batch trial production and large-scale mass production.
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